COMPOUNDS, PROCESS FOR PRODUCTION THEREOF, LOW-MOLECULAR COMPOUNDS, POSITIVE RESIST COMPOSITIONS AND PROCESS FOR FORMATION OF RESIST PATTERNS

摘要

Compounds represented by the general formula (I) or (I') wherein R<SUP>11</SUP> to R<SUP>13</SUP> are each alkyl having 1 to 10 carbon atoms; s is an integer of 1 to 2; t is an integer of 1 to 3; u is an integer of 1 to 3; the sum of s, t and u is an integer of 3 to 5; q is an integer of 0 to 2; r is an integer of 1 to 3; and p is 1 or 2.