| 摘要 |
An evaporator device with which highly simmering substances are transferred into the gaseous phase, without a too high thermal radiation arrives at a substrate which can be coated. In an evaporator device for coating a substrate, comprising an evaporator(19) having linearly arranged distributors(30-33) as well as a heating system(22), wherein the surface of a material to be vaporized extends to a first plane, the evaporator device is characterized in that the linearly arranged distributors are positioned in a second plane perpendicular to the first plane and the heating system is provided within the evaporator. The heating system is an electric resistance heating system. The heating system is positioned in the center of the evaporator. The heating system is positioned on the inner wall of the evaporator. The heating system is disposed straightly at linearly arranged distributor openings. The linearly arranged distributor openings are formed by a nozzle bar, and the heating system is provided right behind the nozzle bar. The heating system comprises plural heating rods. The evaporator is tubular. The heating system comprises meander-shaped heating elements. The heating system comprises rod-shaped heating elements. The heating rods form a cylinder.
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