| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum vapor-deposition apparatus which prevents a splash material from depositing on a long strip of a substrate even if splash has occurred, and minimizes a part having no vaporizing material deposited on the long strip of the substrate. SOLUTION: This vacuum vapor-deposition apparatus comprises: a substrate-conveying unit 3 for continuously conveying the long strip of the substrate; a heating devices 51 and 52 for heating the vaporizing material in a crucible 4; a vaporizing-material-supplying device 7 for supplying the vaporizing material to the crucible 4; an opening and closing shutter 6; a device 81 for detecting an amount of a molten metal; a temperature-detecting device 82; and a control means 9. The opening and closing shutter 6 is movably arranged in between the long strip and the crucible 4, closes a passage between the crucible 4 and the long strip when set at a closing position, and prevents the vaporizing material from depositing on the long strip. The operation method includes the steps of: stopping the travel of the long strip and closing a passage between the long strip and the crucible 4 with the opening and closing shutter 6; and supplying the vaporizing material to the crucible 4. The operation method also includes prohibiting the supply of the vaporizing material to the crucible 4 during a film-forming step. COPYRIGHT: (C)2007,JPO&INPIT
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