发明名称 CLUSTER TOOL AND METHOD FOR PROCESS INTEGRATION IN MANUFACTURE OF A GATE STRUCTURE OF A FIELD EFFECT TRANSISTOR
摘要 A method and apparatus for process integration in manufacture of a gate structure of a field effect transistor are disclosed. The method includes assembling an integrated substrate processing system having a metrology module and a vacuumed processing platform to perform controlled and adaptive plasma processes without exposing the substrate to a non-vacuumed environment.
申请公布号 US2007026547(A1) 申请公布日期 2007.02.01
申请号 US20060531634 申请日期 2006.09.13
申请人 APPLIED MATERIALS, INC. 发明人 KUMAR AJAY;KRISHNAMURTHY RAMESH
分类号 H01L21/66;H01L21/302 主分类号 H01L21/66
代理机构 代理人
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