发明名称 |
CLUSTER TOOL AND METHOD FOR PROCESS INTEGRATION IN MANUFACTURE OF A GATE STRUCTURE OF A FIELD EFFECT TRANSISTOR |
摘要 |
A method and apparatus for process integration in manufacture of a gate structure of a field effect transistor are disclosed. The method includes assembling an integrated substrate processing system having a metrology module and a vacuumed processing platform to perform controlled and adaptive plasma processes without exposing the substrate to a non-vacuumed environment.
|
申请公布号 |
US2007026547(A1) |
申请公布日期 |
2007.02.01 |
申请号 |
US20060531634 |
申请日期 |
2006.09.13 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
KUMAR AJAY;KRISHNAMURTHY RAMESH |
分类号 |
H01L21/66;H01L21/302 |
主分类号 |
H01L21/66 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|