EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus in which deterioration in exposure performance can be prevented.

SOLUTION: The exposure apparatus EX is provided with a liquid immersion mechanism 1 for filling a part between a final optical element FL and a substrate P with a liquid LQ; an illumination system 30 for irradiating the substrate P with a pulse-like exposure light EL via the final optical element FL and the liquid LQ; and a control device 7 for setting the energy density of the exposure light EL for each pulse at a predetermined value or more to suppress deterioration in transmittivity on a bottom surface T1 of the final optical element FL contacting the liquid LQ.

COPYRIGHT: (C)2007,JPO&INPIT