| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic device having an illuminating system with an optical element that can adjust a radiation beam so as to have a cross-section of a first portion of a linear polarized light radiation and an unpolarized light or a second portion of a circularly polarized light radiation. <P>SOLUTION: The device further has a support constructed to support a patterning device, the patterning device can give a pattern to a cross-section of an illuminating radiation beam to form a patternized radiation beam. The device is configured to support a substrate by providing a substrate table and project the patternized radiation beam to a targeted portion of the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
