发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM, AND MANUFACTURING METHOD OF DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid-immersed projection optical system which is capable of correcting a spherical aberration well, and suppressing the occurrence of other aberrations. <P>SOLUTION: The projection optical system projecting an image on a first plane (R) onto a second plane (W) is equipped with a first light-transmitting member (Lp) arranged nearest to the second plane (W), and a second light-transmitting member (Lb) arranged adjacent to the first light transmitting member (Lp). An optical path located between the first light-transmitting member (Lp) and the second plane (W) is filled up with a first liquid, and an optical path located between the first light-transmitting member (Lp) and the second light-transmitting member (Lb) is filled up with a second liquid whose refractive index is different from that of the first liquid. The first light-transmitting member is constituted so as to be movable in the direction of an optical axis. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007027439(A) 申请公布日期 2007.02.01
申请号 JP20050207836 申请日期 2005.07.15
申请人 NIKON CORP 发明人 FUJISHIMA YOHEI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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