| 发明名称 |
POST LAST WIRING LEVEL INDUCTOR USING PATTERNED PLATE PROCESS |
| 摘要 |
A method of forming a semiconductor structure, and the semiconductor structure so formed, wherein a transmission line, such as an inductor, is formed on a planar level above the surface of a last metal wiring level.
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| 申请公布号 |
US2007026659(A1) |
申请公布日期 |
2007.02.01 |
| 申请号 |
US20050161217 |
申请日期 |
2005.07.27 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHINTHAKINDI ANIL K.;COOLBAUGH DOUGLAS D.;FLORKEY JOHN E.;GAMBINO JEFFREY P.;HE ZHONG-XIANG;STAMPER ANTHONY K.;VAED KUNAL |
| 分类号 |
H01L21/44;H01L21/20;H01L21/4763 |
主分类号 |
H01L21/44 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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