| 摘要 |
<p>A parallax barrier is manufactured by forming a light blocking layer by patterning a metal layer or a resin layer on a barrier glass in a photolithography step. In a mask used in the photolithography step, some of the pitches of slits corresponding to portions whereupon the light blocking layers are formed are different. As far as lithographical accuracy is concerned, a first pitch (for instance, 100) and a second pitch (for instance 99.5), which can be actually formed, are formed in each cycle, and the average of such pitches is permitted to accord with a theoretical pitch (for instance, 99.99). Thus, in the parallax barrier to be used for a multiple display device, visibility of the entire screen can be improved, and the parallax barrier which can be manufactured by employing the mask lithography technology having a limited accuracy, and a method for manufacturing such parallax barrier are provided.</p> |
