| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent decrease in the quality of an exposure pattern to be imaged on a photosensitive material in an aligner. <P>SOLUTION: A spatial light modulator 80 is used in an aligner 200, the modulator including: a modulation element array 81 configured by a large number of two-dimensionally arrayed modulation elements 82 to modulate light Le at a wavelength in a UV or violet region emitting from a light source; a translucent window 87 made of a transmissive material which transmits the light Le; and a sealing cover 88 to hermetically seal the element array 81 between the cover and the translucent window 87. The aligner 200 allows the light Le emitted from the light source 66 which is incident through the translucent window 87: to be spatially optically modulated by the modulation element array 81; to be ejected from the translucent window 87; and to be imaged on a photosensitive material to expose the photosensitive material, wherein quartz glass is used for the translucent material of the translucent window 87 and its thickness is specified to from 1 mm to 5 mm. <P>COPYRIGHT: (C)2007,JPO&INPIT |
