发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMING METHOD AND METHOD FOR PRODUCING PRINTED WIRING BOARD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of suppressing generation of bubbles in a developer during development and capable of forming a resist having excellent adhesion to a conductor layer as well as excellent resolution. <P>SOLUTION: The photosensitive resin composition contains a binder polymer, a photopolymerizable compound having a polymerizable ethylenically unsaturated group represented by formula (1), and a photopolymerization initiator, wherein R<SP>11</SP>is H or methyl; R<SP>12</SP>is alkyl or cycloalkyl; R<SP>13</SP>and R<SP>14</SP>are each alkylene but denote groups different from each other; and p and q are each independently an integer of 1-15. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007025168(A) |
申请公布日期 |
2007.02.01 |
申请号 |
JP20050206050 |
申请日期 |
2005.07.14 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
ISHIKAWA TSUTOMU;WATANABE MITSUAKI |
分类号 |
G03F7/027;C08F290/06;G03F7/004;G03F7/033;H05K3/06;H05K3/18 |
主分类号 |
G03F7/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|