| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a device having a complicated structure and a movable mirror in a short time. SOLUTION: A mask material layer 44 is formed on a substrate 31 composed of a silicon substrate 42 and a monocrystalline silicon device layer 43 interposing an internal layer 41 of silicon dioxide therebetween (Fig. A), and a mask 45 having the same pattern of the flat shape of a target optical device is formed by patterning the mask material layer 44. In this case, a face to be a mirror face is made to be the (100) face of silicon crystal. The device layer 43 is vertically etched by using the mask 45 as an etching mask until the internal layer 41 is exposed by a reactive ion dry etching method (Fig. C). Thereafter, anisotropic wet etching is performed to the crystal orientation with a KOH solution for approximately 10 minutes to obtain a flat crystal face (100) on the side wall face of a mirror 4. Next, the internal layer 41 is selectively wet-etched to remove only the internal layer 41 under the movable part of the optical device. COPYRIGHT: (C)2007,JPO&INPIT
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