Systems and methods for implant dosage control

摘要

A system for implantation dosage control. A first interface receives scan position information. A second interface receives beam current information specifying a first beam current value between scans and a plurality of second beam current values during one of the scans. A controller, determines a tolerance range according to the first beam current value, determines whether the second beam current values exceeds the tolerance range, and calculates number of the second beam current values exceeding the tolerance range.