SYSTEM FOR INSPECTING WAFERS IN A LASER MARKING SYSTEM WITH AN ILLUMINATION SYSTEM ILLUMINATING A SURFACE OF THE WAFER AT ANGLE BETWEEN 45° AND 70° WITH RESPECT TO THIS SURFACE

摘要

An illumination system (60, 62) is disclosed for use in a semiconductor wafer back side inspection assembly (40). The illumination system (60, 62) includes an illumination source (60, 62) that is configured to direct illumination toward a highly reflective and directionally reflective surface (58) at an angle alpha of 45 degrees to 75 degrees with respect to the surface (58).