发明名称 Regulation of gas discharge phenomena and plasma, on deposition of thin layers by sputtering, uses a separate control of the current density and energy
摘要 <p>To regulate gas discharge phenomena and plasma, when depositing thin layers by sputtering, uses a separate regulation of the current density and the energy. The discharge is used as a conductor and accelerator of the ions to improve the transport of particles in the ionized gas zone.</p>
申请公布号 DE102004059607(A1) 申请公布日期 2007.02.01
申请号 DE20041059607 申请日期 2004.12.10
申请人 SAMARESCU, DAN FLORIAN 发明人 SAMARESCU, DAN FLORIAN
分类号 H01J37/34 主分类号 H01J37/34
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