发明名称 STAGE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a stage apparatus for preventing the occurrence of vibration caused when a support member for supporting an object is elevated/descended in a direction of the Z axis. <P>SOLUTION: The stage apparatus 10 includes a wafer support member 14 to which a wafer 12 is placed, a Z axis support base 18 for supporting a Z axis member 16 of the wafer support member 14 in an elevatable/descendable way, a &theta;z support base 22 for revolvably supporting the Z axis support base 18 via a bearing 20, and an XY table 24 mounted with the &theta;z support base 22. A stator 36a of each of Z axis actuators 36 is fixed on a plane 34 of the &theta;z support base 22, and a rotor 36b of each of the Z axis actuators 36 is fixed to both ends of a lateral frame member 14b of the wafer support member 14. Thus, a couple of the Z axis actuators 36 is controlled to provide a driving force to the lateral frame member 14b of the wafer support member 14 at the same time. In this case, since the reaction force of the driving force to the Z axis actuators 36 is received by the &theta;z support base 22 and the XY table 24, the occurrence of vibration due to the reaction force can be prevented. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007027659(A) 申请公布日期 2007.02.01
申请号 JP20050211724 申请日期 2005.07.21
申请人 SUMITOMO HEAVY IND LTD 发明人 NAKAJIMA RYUTA
分类号 H01L21/027 主分类号 H01L21/027
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