| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment error detection method detecting an error with high accuracy, and also to provide an exposure processing method using the detection method. <P>SOLUTION: A plurality of measurement points are measured to obtain a measurement deviation from the measurement result. Then a characteristic parameter representing characteristics of a substrate is obtained by using a least square method from the obtained measurement deviation. Then a calculation deviation which is a deviation by calculation at each measurement point is obtained from the obtained measurement deviation and the obtained characteristic parameter. An alignment error at each measurement point is detected, using the error between the obtained measurement deviation and the calculation deviation. Specifically, if the error is out of a predetermined range based on EGA (Enhanced Global Arrayment) superposition accuracy, it is judged that a measurement error is present. <P>COPYRIGHT: (C)2007,JPO&INPIT |
