发明名称 MEASUREMENT APPARATUS, PROJECTION EXPOSURE APPARATUS, AND MANUFACTURING METHOD OF MICRO DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a measurement apparatus capable of simultaneously and individually measuring space images of various patterns formed by an optical system. <P>SOLUTION: The measurement apparatus 59 for measuring space images formed via an optical system includes a reference member 29A arranged at an area wherein the space images are formed, and formed with a plurality of measurement patterns P1 to P6; a plurality of condensing optical systems 82D to 82F for condensing each measurement light via the measurement patterns P1 to P6; transmission optical systems 90A, 92A, 90B and 92B for transmitting the measured light via the condensing optical systems 82D to 82F; and light receiving means 94A, 94B for receiving the measured light transmitted from the transmission optical systems 90A, 92A, 90B and 92B. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007027660(A) 申请公布日期 2007.02.01
申请号 JP20050211742 申请日期 2005.07.21
申请人 NIKON CORP 发明人 NAKAGAWA MASAHIRO;ARAI MASARU
分类号 H01L21/027;G01B11/00;G01M11/00;G01M11/02;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址