发明名称 LASER BEAM IRRADIATION APPARATUS AND LASER BEAM SCRIBING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a laser beam irradiation apparatus capable of scribing a work with high productivity, and a laser beam scribing method using the laser beam irradiation apparatus. <P>SOLUTION: The laser beam irradiation apparatus 100 comprises a laser beam source 101, a condensing lens 103 for condensing laser beams, a Z-axis slide mechanism 104 capable of moving the condensing lens 103 in the Z-axis direction, an X-axis slide part 108 and a Y-axis slide part 106 capable of moving a stage 105 with a substrate W placed thereon in a plane substantially orthogonal to the optical axis 101a, a lens control part 122 for controlling the Z-axis slide mechanism 104, a stage control part 123 for controlling the X-axis slide part 108 and the Y-axis slide part 106, and a main computer 120 for integrally controlling each part. The main computer 120 performs scanning by irradiating laser beams by successively shifting the position of the focal point of the laser beam condensing point by the Z-axis slide mechanism 104. Further, laser beams are irradiated by changing the speed of relatively moving the substrate W for each scanning. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007021558(A) 申请公布日期 2007.02.01
申请号 JP20050209554 申请日期 2005.07.20
申请人 SEIKO EPSON CORP 发明人 KUROKI YASUNOBU;UMETSU KAZUNARI
分类号 B23K26/38;B23K26/00;B23K26/04;B23K26/08;B23K26/40;B23K101/40;B28D5/00 主分类号 B23K26/38
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