| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide gas using equipment and an exhaust gas classifying method by which desired exhaust gas can be efficiently recovered from the exhaust gas discharged from a gas reaction apparatus. <P>SOLUTION: The gas using equipment 1 is constituted of the gas reaction apparatus 80 such as a semiconductor manufacturing apparatus which is operated under vacuum, an exhaust gas treating apparatus 90 for treating the exhaust gas and pipes connecting these. The exhaust gas treating apparatus has a vacuum pump 30 for sucking the exhaust gas and discharging the gas to a downstream side, a gas treating section 50 for performing prescribed treatment to the exhaust gas, a treatment line 70 for guiding the exhaust gas discharged from the vacuum pump into the gas treating section, an air exhaust line 71 for exhausting the exhaust gas and a switching valve which is provided at a downstream side of the vacuum pump and switches an exhaust gas flow passage to the treatment line 70 or to the air exhaust line 71. Further the gas using equipment has piping structure with which circulation of the exhaust gas in a hollow section 44 formed between the vacuum pump and a branching section 45 of the lines has space velocity of≥3 [min<SP>-1</SP>]. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
