| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a vacuum cluster for forming a film on a substrate, which enables easy maintenance, offers a high productivity, prevents deposition of contaminants and impurities derived from a member surface onto the substrate and yields a homogenous film with a uniform thickness. <P>SOLUTION: The vacuum cluster comprises a vacuum chamber, a substrate holder for positioning the substrate, a treatment apparatus for forming the film on the substrate and a system for delivering the treatment apparatus, which is mounted so as to reciprocate parallel to the surface of the substrate holder and/or the substrate. The vacuum chamber has a principal compartment and at least one treatment compartment. The treatment apparatus is located inside the treatment compartment of the vacuum chamber and is mounted so as to reciprocate parallel to the surface of the substrate holder and/or the substrate inside the principal compartment of the vacuum chamber. The system for delivering the treatment apparatus is located outside the vacuum chamber and couples with the treatment apparatus via the substrate holder. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
