发明名称 ELECTRON BEAM APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an electron beam apparatus which can improve the sharpness of the edge of a beam even when the current density is enhanced. SOLUTION: The apparatus for shaping a beam of electrons and irradiating a sample, comprises an electron source S for generating the beam of electrons; a first focusing lens CL1 for focusing the beam of electrons and forming a first image of the electron source; a first and second slit SL1, SL2 for shaping the beam of electrons; a second focusing lens CL2 for conjugately connecting the two slits and forming a second image as an object of the first image backward; additional lenses AL1, AL2 for reducing the first and second slit to image before an objective lens OL, and enlarging the second image to image a third image at a nodal surface (or a main surface) of the objective lens OL; and an objective lens for finally imaging the image of the slit on a sample plane. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007027017(A) 申请公布日期 2007.02.01
申请号 JP20050210874 申请日期 2005.07.21
申请人 JEOL LTD 发明人 MATSUTANI MIYUKI;GOTO KAZUYA
分类号 H01J37/153;H01L21/027 主分类号 H01J37/153
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