发明名称 SUBSTRATE INSPECTION DEVICE AND SUBSTRATE INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To discriminate a surface defect from an internal defect of the substrate efficiently in a one-time inspection process. SOLUTION: An inspection light floodlighting system in an optical system 10 irradiates obliquely the back of the substrate 1 with inspection light. The first light receiving system including a CCD line sensor 21 receives scattered light acquired by scattering the inspection light by a surface/internal defect of the substrate 1 in the focused state onto the substrate 1 surface. The second light receiving system including a CCD line sensor 22 receives scattered light acquired by scattering the inspection light by the surface/internal defect of the substrate 1 in the focused state to the substrate 1 inside. A signal processing circuit 60 discriminates between the surface defect and the internal defect of the substrate 1 from the intensity difference between the scattered light received by the first light receiving system and the scattered light received by the second light receiving system. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007024733(A) 申请公布日期 2007.02.01
申请号 JP20050209218 申请日期 2005.07.19
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 IWAI SUSUMU;KATO NOBORU
分类号 G01N21/958 主分类号 G01N21/958
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