发明名称 GAS SUPPLY APPARATUS OF EQUIPMENT FOR SEMICONDUCTOR MEMORY MANUFACTURING
摘要 A gas supply apparatus of semiconductor device manufacturing equipment is provided to prevent process accidents by checking the variation of flow rate of process gas with naked eyes using a display unit. A gas supply apparatus of semiconductor device manufacturing equipment includes at least one gas supply line(110), at least one mass flow rate controller on the gas supply line and a display unit. The display unit(400) is electrically connected with the mass flow rate controller. The mass flow rate controller is composed of a flow rate sensing part, a circuit part, a voltage output part, and a control valve. The circuit part is electrically connected with the flow rate sensing part. The circuit part is used for transforming the flow rate of process gas into a voltage value. The voltage output part is electrically connected with the circuit part in order to output the voltage value. The control valve is used for controlling the flow rate of the process gas. The display unit is electrically connected with the voltage output part of the mass flow rate controller.
申请公布号 KR20070014879(A) 申请公布日期 2007.02.01
申请号 KR20050069862 申请日期 2005.07.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 ANN, JAE SU
分类号 H01L21/02 主分类号 H01L21/02
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