发明名称 |
Fabricating sub-lithographic contacts |
摘要 |
A small critical dimension element, such as a heater for an ovonic unified memory, may be formed within a pore by using successive sidewall spacers. The use of at least two successive spacers enables the limitations imposed by lithography and the limitations imposed by bread loafing to be overcome to provide reduced critical dimension elements.
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申请公布号 |
US2007023857(A1) |
申请公布日期 |
2007.02.01 |
申请号 |
US20050193952 |
申请日期 |
2005.07.29 |
申请人 |
JIN MING;KARPOV ILYA V;LEE JINWOOK;RAMANUJA NARAHARI |
发明人 |
JIN MING;KARPOV ILYA V.;LEE JINWOOK;RAMANUJA NARAHARI |
分类号 |
H01L29/00 |
主分类号 |
H01L29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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