Polymer compound, resist material and pattern formation method

摘要

The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 4 and a second unit represented by a general formula of the following Chemical Formula 5: wherein R¹, R² and R³ are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R⁴ is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R⁵ and R⁶ are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; R⁷ is a methylene group, an oxygen atom, a sulfur atom or -SO₂-; R⁸, R⁹, R¹⁰ and R¹¹ are the same or different and are a hydrogen atom, a fluorine atom, a hydroxyl group, -OR¹³, CO₂R¹³, -R²-OR¹³ or -R¹²-CO₂R¹³, at least one of R⁸, R⁹, R¹⁰ and R¹¹ including -OR¹³, -CO₂R¹³, -R¹²-OR¹³ or -R¹²-CO₂R¹³ (wherein R 2 is a straight-chain alkylene group, a branched or cyclic alkylene group or a fluoridated alkylene group with a carbon number not less than 1 and not more than 20 and R¹³ is a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid); 0