发明名称 PROCESS AND DEVICE FOR CLEANING AND ETCHING A SUBSTRATE WITH A TRANSPARENT CONDUCTIVE OXIDE LAYER
摘要 A simple process is disclosed for treating substrates having pre- structured zinc oxide layers on rigid or flexible supports. The ZnO is treated with an etching medium then with a cleaning liquid. The treatment with the etching and cleaning liquids is carried out while the substrate is conveyed through a device. The process is technically simple to implement and makes it possible to regularly and homogeneously roughen and texturise ZnO layers of up to 1 m2. The device for treating substrates having pre-structured zinc oxide layers on rigid or flexible supports has for that purpose a first means for treating the substrate with an etching liquid, a second means for treating the substrate with a cleaning liquid, and another means, in particular transport rollers, for conveying the substrate from the first to the second means. ® KIPO & WIPO 2007
申请公布号 KR20070013280(A) 申请公布日期 2007.01.30
申请号 KR20067020962 申请日期 2005.03.31
申请人 FORSCHUNGSZENTRUM JULICH GMBH 发明人 MULLER JOACHIM;SCHOPE GUNNAR;SIEKMANN HILDEGARD;RECH BERND;REPMANN TOBIAS;APENZELLER WOLFGANG;SEHRBROCK BRIGITTE
分类号 H01L21/302;H01L21/00;H01L31/00;H01L31/18 主分类号 H01L21/302
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