Method and system for maskless lithography real-.time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation
摘要
申请公布号
SG128657(A1)
申请公布日期
2007.01.30
申请号
SG20060004436
申请日期
2006.06.29
申请人
ASML HOLDING N.V.;ASML NETHERLANDS B.V.
发明人
LATYPOV, AZAT, M.;BASELMANS JOHANNES JACOBUS MATHEUS;TROOST KARS ZEGER
