| 发明名称 |
Gas distribution system with tuning gas |
| 摘要 |
An apparatus for providing different gases to different zones of a processing chamber is provided. A gas supply for providing an etching gas flow is provided. A flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into a plurality of legs is provided. A tuning gas system in fluid connection to at least one of the legs of the plurality of legs is provided.
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| 申请公布号 |
US7169231(B2) |
申请公布日期 |
2007.01.30 |
| 申请号 |
US20020318612 |
申请日期 |
2002.12.13 |
| 申请人 |
LAM RESEARCH CORPORATION |
发明人 |
LARSON DEAN J.;KADKHODAYAN BABAK;WU DI;TAKESHITA KENJI;YEN BI-MING;SU XINGCAI;DENTY, JR. WILLIAM M.;LOEWENHARDT PETER |
| 分类号 |
C23C16/52;C23C16/00;C23C16/455;H01L21/00;H01L21/306 |
主分类号 |
C23C16/52 |
| 代理机构 |
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