| 摘要 |
A faraday system and an ion implanter using the same are provided to improve the yield by preventing the contamination of a wafer using a rotatable housing structure with a plurality of holes. A faraday system is used for detecting the dose of ions by measuring the current of an ion beam. The faraday system includes a faraday cup(112) for collecting the ion beam and generating a corresponding current, a restraint electrode, and a housing. The restraint electrode(114) generates an electric field at a periphery of an inlet of the faraday cup to prevent the emission of secondary electrons due to the collected ion beam. The housing(116) encloses the restraint electrode and the faraday cup. The housing includes a plurality of holes capable of passing selectively the ion beam according to the kind of the collected ion beam. The housing is rotated to rotate the holes in one direction.
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