发明名称 Wiring and method of manufacturing the same, and wiring board and method of manufacturing the same
摘要 The wiring of the present invention has a layered structure that includes a first conductive layer (first layer) having a first width and made of one or a plurality of kinds of elements selected from W and Mo, or an alloy or compound mainly containing the element, a low-resistant second conductive layer (second layer) having a second width smaller than the first width, and made of an alloy or a compound mainly containing Al, and a third conductive layer (third layer) having a third width smaller than the second width, and made of an alloy or compound mainly containing Ti. With this constitution, the present invention is fully ready for enlargement of a pixel portion. At least edges of the second conductive layer have a taper-shaped cross-section. Because of this shape, satisfactory coverage can be obtained.
申请公布号 US7169710(B2) 申请公布日期 2007.01.30
申请号 US20020099972 申请日期 2002.03.19
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;SUZAWA HIDEOMI;ONO KOJI;KUSUYAMA YOSHIHIRO
分类号 G02F1/1345;H01L21/461;G02F1/1362;H01L21/302;H01L21/336;H01L23/528;H01L23/532;H01L27/32;H01L29/786;H01L51/52 主分类号 G02F1/1345
代理机构 代理人
主权项
地址