发明名称 Method and apparatus for passing charge from word lines during manufacture
摘要 A plasma damage protection circuit includes a word line driver circuit with plasma damage protection features. If, during manufacture, plasma-based processes cause charge to build up on the word lines, the charge passes from the word lines through at least the word line drivers to the semiconductor substrate. Another plasma-based protection circuit includes a device coupled to multiple word line drivers. If, during manufacture, plasma-based processes cause charge to build up on the word lines, the charge passes from the word lines through at least the device to the semiconductor substrate. Thus, these plasma-based protection circuits save space while protecting the integrated circuit from plasma process-based damage.
申请公布号 US7170816(B2) 申请公布日期 2007.01.30
申请号 US20040014258 申请日期 2004.12.16
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 HUANG JEN-REN;CHOU MIN-HUNG;SHIH YI-CHUN
分类号 G11C8/00 主分类号 G11C8/00
代理机构 代理人
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