发明名称 Focus determination method, device manufacturing method, and mask
摘要 <p>One or more focus settings for use in a device manufacturing method is determined by printing a plurality of target markers at different focus settings on a test substrate, and using a scatterometer, e.g. off-line, to measure a property of the target markers that is indicative of focus.</p>
申请公布号 SG128658(A1) 申请公布日期 2007.01.30
申请号 SG20060004437 申请日期 2006.06.29
申请人 ASML NETHERLANDS B.V. 发明人 SCHAAR VAN DER MAURITS;BOEF DEN ARIE JEFFREY;DUSA MIRCEA;KIERS ANTOINE GASTON MARIE
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