| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic apparatus is provided in which the projection system (PL) is compliantly mounted on a reference frame (5) which in turn is compliantly mounted on the base (BP) which supports the apparatus. Therefore any vibrations and displacement errors in the base (BP) are filtered through two sets of compliant mounts (6, 7) and therefore disturbance of the projection system (PL) is reduced.
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| 申请公布号 |
SG128443(A1) |
申请公布日期 |
2007.01.30 |
| 申请号 |
SG20030003964 |
申请日期 |
2003.07.09 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS;LOOPSTRA ERIK ROELOF;BARTRAY PETRUS RUTGERUS;WIJST VAN DER MARC WILHELMUS MARIA;RENKENS MICHAEL JOZEFA MATHIJS;SCHOTHORST VAN GERARD DRIES JOHAN JULIANA |
| 分类号 |
F16F15/02;G03F7/20;H01L21/027 |
主分类号 |
F16F15/02 |
| 代理机构 |
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