| 摘要 |
PROBLEM TO BE SOLVED: To provide a charge reducing apparatus used in an exposing device or a measuring device which irradiates a charged particle beam from a charged particle source to a sample, by applying deflection control by deflection electrodes disposed face to face in a vacuum column to reduce the charge of a portion charged with positive or negative electricity by the charged particle beam in the deflection electrodes, the exposure apparatus and the measuring apparatus equipped with the charge reducing apparatus, and to provide a manufacturing method for a device that uses the exposure device. SOLUTION: This charge reducing device has an electron beam irradiation means to irradiate an electron beam to the charged portion of the deflection electrodes which are charged with positive or negative electricity by the charged particle beam, and a means of changing the irradiation energy of the electron beam. Thereby, charge of the deflection electrodes is reduced; and since even if the deflection electrodes are charged with both positive and negative electricity, two of positive and negative beam sources are not used, but charge can be reduced by using only the electron beam, the constitution of the device can be simplified. COPYRIGHT: (C)2007,JPO&INPIT
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