发明名称 IMPROVED DESIGN POLISHING MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a covered polishing material suitable for use in very fine polishing. SOLUTION: This covered polishing material has a polishing material surface designed to contain a number of formed complexes bonded to a common backing. Each complex has a particle layer of functional powder containing cured resin, and adhering to the abrasive grain dispersed therein and formed polishing material complex to be bonded, and a top upper coating layer is placed on the functional powder particle. As the functional powder, cited are fine abrasive grain, grinding assistant, anti-static additives, lubricant powder and so on. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007015103(A) 申请公布日期 2007.01.25
申请号 JP20060203569 申请日期 2006.07.26
申请人 SAINT-GOBAIN ABRASIVES INC 发明人 NEVORET DAMIEN;PEHKONEN MARC;WEI PAUL;SWEI GWO SHIN
分类号 B24B37/00;B24D11/00;B24D3/00;B24D3/28;B24D3/34;C09K3/14 主分类号 B24B37/00
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