| 发明名称 |
SYSTEM FOR SUPPORTING AND ROTATING A SUSCEPTOR INSIDE A TREATMENT CHAMBER OF A WATER TREATING APPARATUS |
| 摘要 |
<p>The present invention relates to a system for supporting and rotating a susceptor within the treatment chamber of a wafer treatment apparatus comprising a support member (2) placed inside the treatment chamber and capable of supporting a susceptor (3), means (4) capable of lifting the support member (2) via a lifting gas flow, and means (5) capable of rotating the support member (2) via a rotation gas flow.</p> |
| 申请公布号 |
WO2007010568(A1) |
申请公布日期 |
2007.01.25 |
| 申请号 |
WO2005IT00425 |
申请日期 |
2005.07.21 |
| 申请人 |
LPE S.P.A.;POZZETTI, VITTORIO;CRIPPA, DANILO;PRETI, FRANCO |
发明人 |
POZZETTI, VITTORIO;CRIPPA, DANILO;PRETI, FRANCO |
| 分类号 |
H01L21/00;C23C16/458;C30B25/12 |
主分类号 |
H01L21/00 |
| 代理机构 |
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