<p>A sputtering target characterized by consisting of a sintered body of oxide containing In and Sm as main components. Further, there is provided a sputtering target characterized by consisting of a sintered body of oxide containing In and Sm as main components doped with at least one element with an atomic valency of positive tetravalency or higher in an amount of 20 at.% or less based on the sum of all cation elements.</p>
申请公布号
WO2007010702(A1)
申请公布日期
2007.01.25
申请号
WO2006JP312412
申请日期
2006.06.21
申请人
IDEMITSU KOSAN CO., LTD.;INOUE, KAZUYOSHI;TANAKA, NOBUO;TOMAI, SHIGEKAZU;MATSUBARA, MASATO;KAIJO, AKIRA;YANO, KOKI
发明人
INOUE, KAZUYOSHI;TANAKA, NOBUO;TOMAI, SHIGEKAZU;MATSUBARA, MASATO;KAIJO, AKIRA;YANO, KOKI
