发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device excellent in mountability, and a manufacturing method thereof. <P>SOLUTION: The semiconductor device includes a semiconductor substrate 10 having a plurality of electrodes 14; a resin projection 20 formed on the semiconductor substrate 10; and a wiring 30 electrically connected to the electrodes 14, and formed so as to reach onto the resin projection 20. Concave portions 25 are formed on an upper end surface 22 of the resin projection 20. Notches 32 overlapping with at least one part of the concave portions 25 are formed on the wiring 30. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007019184(A) 申请公布日期 2007.01.25
申请号 JP20050197929 申请日期 2005.07.06
申请人 SEIKO EPSON CORP 发明人 TANAKA SHUICHI
分类号 H01L21/60;H01L21/3205;H01L23/52 主分类号 H01L21/60
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