| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus of manufacturing a semiconductor whereby the variations of the concentrations of sulfuric acid and HF can be prevent in an SFM processing. SOLUTION: The method has: a step for carrying a semiconductor substrate 1 in an inner vessel 2a for processing to which a mixed liquid 3 comprising sulfuric acid, HF, and H<SB>2</SB>O is fed; a step for disposing the inner vessel 2a for processing in an enclosed space 6; and a step for bringing the enclosed space 6 into an HF-volatilization-resistant atmosphere and/or a drying atmosphere. COPYRIGHT: (C)2007,JPO&INPIT
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