PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES

摘要

Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X¹, X² and X³ are independently selected from straight-chain or cyclic C₄-C₁₂ alkylene and C₆-C₁₀ arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R¹, R² and R³ are independently selected from (II) and (III) with the proviso that (1) n = 0 in at least one of the groups R¹, R² and R³, and (2) n > 2 in at least one of the groups R¹, R² and R³, and (3) at least one group R⁶ is different from H in formula (III).