| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition improved in exposure latitude and PEB temperature dependency and a pattern forming method using the photosensitive composition, as a photosensitive composition used in a process of producing a semiconductor such as IC, in production of a circuit board of a liquid crystal, a thermal head or the like and in another photofabrication process and a pattern forming method using the photosensitive composition. <P>SOLUTION: The positive resist composition comprises (A) a compound capable of generating an acid upon irradiation with an active ray or radiation, (B) a resin of which the solubility in an alkali developer increases by the action of an acid, (C) a compound represented by formula (C1) and (D) a solvent. The pattern forming method using the resist composition is also provided. In the formula (C1), R<SB>1</SB>represents a hydrocarbon group, R<SB>2</SB>and R<SB>3</SB>each independently represent H or a hydrocarbon group, and R<SB>1</SB>-R<SB>3</SB>may bond to each other to form a ring structure. <P>COPYRIGHT: (C)2007,JPO&INPIT |
