发明名称 METHOD OF PLANNING EXAMINATION
摘要 PROBLEM TO BE SOLVED: To shorten the planning for examination of an examined object in the examination in which the object is measured at different positions in an examination stand. SOLUTION: The method of planning the examination comprises a step of producing at least one overall image to plan another image in the examined object, a step of determining the position of at least one first image in the examined object photographed at a first position in the examination stand, a step of setting the measurement parameter for the at least one first image at the first position in the examination stand, a step of determining the position of at least one second image in the examined object photographed at a second position in the examination stand, and a step of setting the measurement parameter for the at least one second image at the second position in the examination stand. The position of the at least one second image and the measurement parameter for the second image of the examined object at the second position in the examination stand are determined before the at least one first image is photographed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007014782(A) 申请公布日期 2007.01.25
申请号 JP20060187139 申请日期 2006.07.06
申请人 SIEMENS AG 发明人 MAIER CLAUS;MOHR CECILE;MUELLER MIKE
分类号 A61B5/055;G01R33/54 主分类号 A61B5/055
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