Method of processing semiconductor substrate responsive to a state of chamber contamination

摘要

In one embodiment, a method of processing a semiconductor substrate includes measuring a state of a processing chamber contamination before processing each semiconductor substrate. A process condition is then changed responsive to the state of chamber contamination to compensate for an influence of the state of chamber contamination on the process condition. If the change in process condition is outside of predetermined margin, a warning may be generated and the process may be stopped.