发明名称 |
Apparatus to treat a substrate |
摘要 |
An apparatus to treat a substrate includes a processing chamber including a reaction space where a substrate to be treated is placed and a plasma is formed, a ferrite core having a plurality of poles disposed outside the reaction space and a connector facing the reaction space across the plurality of poles and connecting the plurality of the poles each other, a coil winding around the plurality of poles, and an electric power unit supplying electric power to the coil.
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申请公布号 |
US2007017446(A1) |
申请公布日期 |
2007.01.25 |
申请号 |
US20060417043 |
申请日期 |
2006.05.04 |
申请人 |
JEON SANG-JEAN;PARK JONG-ROK;SA SUNG-YEUP;YANG HEE-JEON;LEE GUEN-SUK |
发明人 |
JEON SANG-JEAN;PARK JONG-ROK;SA SUNG-YEUP;YANG HEE-JEON;LEE GUEN-SUK |
分类号 |
C23F1/00;C23C16/00;H01L21/302 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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