| 发明名称 |
PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS |
| 摘要 |
<p>A pellicle for use in a microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle (34; 134; 234) . This ensures smaller variations of the transmittance over a broad range of angles of incidence, as it occurs in very high numerical aperture projection lenses.</p> |
| 申请公布号 |
WO2007009543(A1) |
申请公布日期 |
2007.01.25 |
| 申请号 |
WO2006EP05833 |
申请日期 |
2006.06.19 |
| 申请人 |
CARL ZEISS SMT AG;GOEHNERMEIER, AKSEL;PAZIDIS, ALEXANDRA |
发明人 |
GOEHNERMEIER, AKSEL;PAZIDIS, ALEXANDRA |
| 分类号 |
G03F1/14;G03F7/20 |
主分类号 |
G03F1/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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