发明名称 Wafer treatment method fixes wafer with specified sections onto clamping table of polishing machine, with wafer upside down, for section of wafer rear side polishing
摘要 <p>Wafer treatment method facilitates dividing into components by grooves, forming component region surrounded by edge region. It contains rear side polishing of wafer clamp on clamping table of polishing machine, with wafer positioned upside down.Polishing produces rear side depression, corresponding to front side component region, surrounded by rear side, annular strengthening edge. Then protective foil is applied on depressed region, followed by separating wafer components on clamping table of separating machine.</p>
申请公布号 DE102006032458(A1) 申请公布日期 2007.01.25
申请号 DE20061032458 申请日期 2006.07.13
申请人 DISCO CORP. 发明人 SEKIYA, KAZUMA
分类号 H01L21/304;H01L21/301 主分类号 H01L21/304
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