PHOTORESIST COMPOSITION, METHOD FOR FORMING PATTERN USING THE PHOTORESIST COMPOSITION, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR DISPLAY PANEL USING THE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To control the amount of a photoresist remaining in a channel region to be uniform and to reduce projections at an end of a semiconductor layer, in relation to a method for forming a pattern using a photoresist composition and to a method for manufacturing a thin film transistor display panel.

SOLUTION: The method for manufacturing a thin film transistor display panel includes steps of: forming a gate line on a substrate; depositing a gate insulating film and a semiconductor layer on the gate line; depositing a data layer on the semiconductor layer; forming a resist film containing a photosensitive compound comprising an alkali-soluble resin and a four-nuclide p-cresol on the data layer; patterning the resist film and subjecting the data layer to first etching using the resist pattern as an etching mask; etching the semiconductor layer using the data layer as an etching mask; reflowing the resist pattern; and subjecting the data layer to second etching using the resist pattern as an etching mask.

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