| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of suppressing generation of foreign substances during coating on a substrate. <P>SOLUTION: The photosensitive composition comprises (a) a colorant, (b) a photopolymerizable compound, (c) a photopolymerization initiator and (d) a solvent, wherein the photosensitive composition comprises a solvent represented by Formula (1): R<SP>1</SP>-O-C<SB>n</SB>H<SB>2n</SB>-O-C<SB>n</SB>H<SB>2n</SB>-OH as the solvent (d), wherein R<SP>1</SP>denotes a 1-8C straight chain, branched chain or cyclic alkyl group or an aryl group, and n denotes an integer of 2-5. <P>COPYRIGHT: (C)2007,JPO&INPIT |
