发明名称 CMOS image sensor and method of fabricating the same
摘要 A complementary metal-oxide semiconductor (CMOS) image sensor and a method of fabricating the same arc disclosed. In a complementary metal-oxide semiconductor (CMOS) image sensor including a photodiode receiving irradiated light and generating electric charges, a plurality of conductive circuits each formed in different layers, a plurality of interlayer dielectrics insulating the conductive circuits, and a micro-lens formed of the interlayer dielectrics and focusing the irradiated light to the photodiode, the CMOS image sensor includes a lens formed in a dome shape on any one of the interlayer dielectrics and re-focusing the light focused by the micro-lens to the photodiode.
申请公布号 US2007018213(A1) 申请公布日期 2007.01.25
申请号 US20060529510 申请日期 2006.09.29
申请人 DONGBUANAM SEMICONDUCTOR INC. 发明人 LIM BI O.
分类号 H01L31/113;H01L27/146;H01L31/06;H01L31/10 主分类号 H01L31/113
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